researchmapのページにリンクしています。
科研費の情報はKAKENを，各種競争的研究費の情報は日本の研究.comをご覧下さい。
最近の論文・書籍・解説など：
Sho Yoshida, Taiki Osawa, Masaya Tahara, Akito Shirai, Hua-Ting Hsieh, Taisei Fukawa, Akane Yaida, Akitoshi Okino, Formation and Mechanistic Elucidation of Antibacterial Coatings from Lactic Acid via Open-Air Plasma CVD, Surfaces (in press). 
Kenichi Yamazaki, Hiroyuki Yasui, Tsuyoshi Noguchi, Yuuma Suenaga, Akitoshi Okino, Stable-quasi-stable deposition regimes in atmospheric-pressure plasma CVD revealed by QCM, Plasma (in press).
大澤泰樹，吉田祥，八井田朱音，沖野晃俊, 異種材料集積光回路に向けた大気圧プラズマによるシリコンウェハの親水化処理, シリコンフォトニクス (in press).
Kai Fukuchi, Syu Yamaji, Yuya Shimizu, Takashi Ohta, Akane Yaida, Yuki Maemoto, Motohide Aoki, Tomonari Umemura, Akitoshi Okino, Development of infrared desolvation device for single cell element analysis using droplet sample injection inductively coupled plasma spectrometry, Anal Sci. (in press).
Yuya Shimizu, Masaya Tahara, Yuwa Ando, Kai Fukuchi, Akane Yaida, Yukiko Moriiwa, Kazuhiro Morioka, Atsushi Shoji, Akitoshi Okino, Fundamental characteristics of voltage-modulated helium plasma for multi-element analysis in low-volume samples, Anal Sci., https://doi.org/10.1007/s44211-026-00880-7 (2026).
大澤泰樹，劉智志，福智魁，八井田朱音，松村有里子，伊藤典彦，岩澤篤郎，沖野晃俊，プラズマを用いた液中病原体の不活化処理，防菌防黴事典 (in press).
Sho Yoshida, Koki Hihara, Junnosuke Furuya, Taiki Osawa, Akane Yaida, Nobuhiko Nishiyama, Akitoshi Okino, Development of a Low-Particle Emission Linear Atmospheric Plasma Device for Hydrophilization of Silicon Wafers, Applied Sciences, 15, 10349 (2025).
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